光刻机:芯片制造中最核心设备,复杂程度高,形成庞大产业链]。光刻环节是晶圆制造中最核心工艺,占晶圆制造耗时40%-50%,占芯片成本30%。作为光刻工艺的核心设备,光刻机结构复杂、成本极高,占晶圆制造设备投资23%。区别于其他晶圆制造设备,浸没式DUV和EUV光刻机可形成自身产业链,因此高端光刻...
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